Highly Scalable ALD-deposited Hafnium Silicate Gate Stacks...

MRS Proceedings 2006 / 1 Vol. 917

Highly Scalable ALD-deposited Hafnium Silicate Gate Stacks for Low Standby Power Applications

Swerts, Johan, Deweerd, Wim, Wang, Chang-gong, Fedorenko, Yanina, Delabie, Annelies, Shero, Eric, Zhao, Chao, Maes, Jan Willem, De Gendt, Stefan, Wilk, Glen
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Volume:
917
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-0917-e11-04
Date:
January, 2006
File:
PDF, 107 KB
english, 2006
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