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n- and p-Type Doping of 4H-SiC by Wet-Chemical Laser Processing
Nishi, Koji, Ikeda, Akihiro, Marui, Daichi, Ikenoue, Hiroshi, Asano, TanemasaVolume:
778-780
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.778-780.645
Date:
February, 2014
File:
PDF, 556 KB
english, 2014