Characterization of Oblique Deposited Nanostructured SiOx...

Solid State Phenomena 2010 / 1 Vol. 159

Characterization of Oblique Deposited Nanostructured SiOx Films by Ellipsometric and IR Spectroscopies

Szekeres, A., Vlaikova, E., Lohner, T., Tóth, Attila L., Lisovskyy, I.P., Zlobin, S.O., Shepeliavyi, P.E.
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Volume:
159
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/ssp.159.149
Date:
January, 2010
File:
PDF, 619 KB
english, 2010
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