Silicon Nitride Film Removal During Chemical Mechanical Polishing Using Ceria-Based Dispersions
Veera Dandu, P. R., Peethala, B. C., Amanapu, H. P., Babu, S. V.Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3596181
File:
PDF, 864 KB
english, 2011