Erbium Silicide Growth in the Presence of Residual Oxygen
Reckinger, Nicolas, Tang, Xiaohui, Godey, Sylvie, Dubois, Emmanuel, Łaszcz, Adam, Ratajczak, Jacek, Vlad, Alexandru, Duţu, Constantin Augustin, Raskin, Jean-PierreVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3585777
File:
PDF, 4.08 MB
english, 2011