Block Co-Polymers for Nanolithography: Rapid Microwave...

Polymers 2015 / 03 Vol. 7; Iss. 4

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Holmes, Justin, Morris, Michael
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Volume:
7
Language:
english
Journal:
Polymers
DOI:
10.3390/polym7040592
Date:
March, 2015
File:
PDF, 12.92 MB
english, 2015
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