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On the influence of the variation of measurement conditions on the FNT characteristics of stressed thin silicon oxides
J.-W Zahlmann-Nowitzki, L Nebrich, P SeegebrechtVolume:
41
Year:
2001
Language:
english
Pages:
3
DOI:
10.1016/s0026-2714(01)00074-9
File:
PDF, 225 KB
english, 2001