Simulation of failure time distributions of metal lines...

Microelectronics Reliability 2002 Vol. 42; Iss. 9-11

Simulation of failure time distributions of metal lines under electromigration

M.R. Carriero, S. Di Pascoli, G. Iannaccone
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Volume:
42
Year:
2002
Pages:
4
DOI:
10.1016/s0026-2714(02)00172-5
File:
PDF, 650 KB
2002
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