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Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 °C
Emil V Jelenkovic, K.Y Tong, W.Y Cheung, S.P WongVolume:
43
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0026-2714(02)00274-3
File:
PDF, 356 KB
english, 2003