Correlation between X-ray micro-diffraction and a developed...

Microelectronics Reliability 2003 Vol. 43; Iss. 9-11

Correlation between X-ray micro-diffraction and a developed analytical model to measure the residual stresses in suspended structures in MEMS

S. Rigo, P. Goudeau, J-M. Desmarres, T. Masri, J-A. Petit, P. Schmitt
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Volume:
43
Year:
2003
Pages:
6
DOI:
10.1016/s0026-2714(03)00331-7
File:
PDF, 1.52 MB
2003
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