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Reliability design of current stress in LSI interconnects using the estimation of failure rate due to electromigration
Kazunori Hiraoka, Tadanobu NikaidoVolume:
37
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0026-2714(96)00301-0
File:
PDF, 534 KB
english, 1997