Application of direct-tunneling gate oxides to...

Microelectronics Reliability 1998 Vol. 38; Iss. 9

Application of direct-tunneling gate oxides to high-performance CMOS

Hisayo Sasaki Momose, Shin-ichi Nakamura, Yasuhiro Katsumata, Hiroshi Iwai
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Volume:
38
Year:
1998
Language:
english
Pages:
11
DOI:
10.1016/s0026-2714(98)00050-x
File:
PDF, 1011 KB
english, 1998
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