Relation between residual stress and electrical properties...

Microelectronics Reliability 2000 Vol. 40; Iss. 4-5

Relation between residual stress and electrical properties of polysilicon/oxide/silicon structures

L Jalabert, P Temple-Boyer, F Olivié, G Sarrabayrouse, F Cristiano, B Colombeau
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0026-2714(99)00271-1
File:
PDF, 167 KB
english, 2000
Conversion to is in progress
Conversion to is failed