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Tetraethylorthosilicate SiO2 films deposited at a low temperature
A.N.R. da Silva, N.I. Morimoto, O. BonnaudVolume:
40
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0026-2714(99)00296-6
File:
PDF, 188 KB
english, 2000