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Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl2/BCl3 Neutral Beam Etching
Yeon, J. K., Lim, W. S., Park, J. B., Kwon, N. Y., Kim, S. I., Min, K. S., Chung, I. S., Kim, Y. W., Yeom, G. Y.Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3561421
File:
PDF, 1.85 MB
english, 2011