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Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation
Lin, Pei-Chun, Yu, Chun-Chang, Chen, Charlie Chung-PingVolume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.14.1.011006
Date:
December, 2014
File:
PDF, 3.16 MB
english, 2014