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Plasma-Induced Damage on the Reliability of Hf-Based High-k/Dual Metal-Gates Complementary Metal Oxide Semiconductor Technology
Weng, Wu-Te, Lee, Yao-Jen, Lin, Horng-Chih, Huang, Tiao-YuanVolume:
2009
Year:
2009
Language:
english
Journal:
International Journal of Plasma Science and Engineering
DOI:
10.1155/2009/308949
File:
PDF, 559 KB
english, 2009