Pushing extreme ultraviolet lithography development beyond...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2009 Vol. 27; Iss. 6

Pushing extreme ultraviolet lithography development beyond 22 nm half pitch

Naulleau, Patrick P., Anderson, Christopher N., Baclea-an, Lorie-Mae, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian, Jones, Gideon, Koh, Chawon, La Fontaine, Bruno,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3237092
File:
PDF, 1.11 MB
english, 2009
Conversion to is in progress
Conversion to is failed