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[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Instability and Defects in Gate Dielectric: Similarity and Differences Between Hf-Stacks and SiO2
Zhang, Jian F., Zhao, Ce, Chang, Mo, Zhang, Weidong, Groeseneken, Guido, Pantisano, Luigi, De Gendt, Stefan, Heyns, MarcVolume:
11
Year:
2007
Language:
english
DOI:
10.1149/1.2779563
File:
PDF, 562 KB
english, 2007