Impact of B 4 C capping layer...

Impact of B 4 C capping layer for extreme ultraviolet mask on the sensitivity of patterned mask inspection using a projection electron microscope

Iida, Susumu, Hirano, Ryoichi, Amano, Tsuyoshi, Watanabe, Hidehiro
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Volume:
13
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.13.4.043015
Date:
December, 2014
File:
PDF, 4.67 MB
english, 2014
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