ECS Transactions [ECS 219th ECS Meeting - Montreal, QC, Canada (May 1 - May 6, 2011)] - Heterogeneous Integration and Fabrication of III-V MOS Devices in a 200mm Processing Environment
Waldron, Niamh, Nguyen, Ngoc Duy, Lin, Dennis, Brammertz, Guy, Vincent, Benjamin, Firrincieli, Andrea, Winderick, Gillis, Sioncke, Sonja, De Jaeger, Brice, Wang, Gang, Mitard, Jerome, Wang, Wei-E, HeyYear:
2011
Language:
english
DOI:
10.1149/1.3569922
File:
PDF, 1.28 MB
english, 2011