Influence of nitrogen flow rate on growth of TiAlN films...

Surface Engineering 2007 / 01 Vol. 23; Iss. 1

Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

Irudayaraj, A. A., Kuppusami, P., Thirumurugesan, R., Mohandas, E., Kalainathan, S., Raghunathan, V. S.
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Volume:
23
Language:
english
Journal:
Surface Engineering
DOI:
10.1179/174329407X161627
Date:
January, 2007
File:
PDF, 234 KB
english, 2007
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