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The Limits of Lamellae-Forming PS- b -PMMA Block Copolymers for Lithography
Wan, Lei, Ruiz, Ricardo, Gao, He, Patel, Kanaiyalal C., Albrecht, Thomas R., Yin, Jian, Kim, Jihoon, Cao, Yi, Lin, GuanyangVolume:
9
Language:
english
Journal:
ACS Nano
DOI:
10.1021/acsnano.5b02613
Date:
July, 2015
File:
PDF, 8.36 MB
english, 2015