Plasma-Enhanced Chemical Vapor Deposition of Si-Rich Silicon Nitride Films Optimized for Waveguide-Based Sensing Applications in the Visible Range
Zermatten, Pierre-Jean, Jaouad, Abdelatif, Blais, Sonia, Gorin, Arnaud, Aimez, Vincent, G. Charette, PaulVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.110205
Date:
October, 2012
File:
PDF, 385 KB
english, 2012