Ta[sub 2]Si Thermal Oxidation: A Simple Route to a High-k Gate Dielectric on 4H-SiC
Pérez-Tomás, A., Godignon, P., Montserrat, J., Millán, J., Mestres, N., Vennegues, P., Stoemenos, J.Volume:
7
Year:
2004
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1819852
File:
PDF, 291 KB
english, 2004