Sensitivity Enhancement for Quantitative Electrochemical Determination of a Trace Amount of Accelerator in Copper Plating Solutions
Chiu, Yong-Da, Dow, Wei-Ping, Huang, Su-Mei, Yau, Shueh-Lin, Lee, Yuh-LangVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3560479
File:
PDF, 6.14 MB
english, 2011