[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Formation of Si Nanocrystals in SiOx Films Induced by Thermal Plasma Jet Annealing and Its Application to Floating Gate Memory
Okada, Tatsuya, Higashi, Seiichiro, Kaku, Hirotaka, Furukawa, Hirokazu, Miyazaki, S.Volume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2980548
File:
PDF, 361 KB
english, 2008