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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Combined metrology including VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher, Pierre, Evrard, Patrick, Piel, Jean-Philippe, Janicot, Sylvie, Stehle, Jean-Louis P., Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436635
File:
PDF, 395 KB
english, 2001