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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - 10nm three-dimensional CD-SEM metrology
Cain, Jason P., Sanchez, Martha I., Vladár, András E., Villarrubia, John S., Chawla, Jasmeet, Ming, Bin, Kline, Joseph R., List, Scott, Postek, Michael T.Volume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2045977
File:
PDF, 2.23 MB
english, 2014