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Boron Diffusion into Si from CVD-BN Covered with Si[sub 3]N[sub 4] and Application to Master Slice p-MOS IC
Shohno, KatsufusaVolume:
127
Year:
1980
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2129947
File:
PDF, 622 KB
english, 1980