SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Studying secondary electron behavior in EUV resists using experimentation and modeling
Wood, Obert R., Panning, Eric M., Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, GVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2086596
File:
PDF, 800 KB
english, 2015