SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of resist material and process for hp-2x-nm devices using EUV lithography
Matsunaga, Kentaro, Oizumi, Hiroaki, Kaneyama, Koji, Shiraishi, Gousuke, Matsumaro, Kazuyuki, Santillan, Julius Joseph, Itani, Toshiro, La Fontaine, Bruno M.Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846088
File:
PDF, 6.85 MB
english, 2010