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Characteristics of low-temperature silicon nitride (SiNx:H) using electron cyclotron resonance plasma
Sanghoon Bae, David G Farber, Stephen J FonashVolume:
44
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0038-1101(00)00086-1
File:
PDF, 200 KB
english, 2000