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Enhancement in soft breakdown occurrence of ultra-thin gate oxides caused by photon effect in rapid thermal post-oxidation annealing
Chia-Hong Huang, Jenn-Gwo HwuVolume:
44
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0038-1101(00)00100-3
File:
PDF, 235 KB
english, 2000