![](/img/cover-not-exists.png)
Current model considering oxide thickness non-uniformity in a MOS tunnel structure
M.I. Vexler, A.F. Shulekin, Ch. Dieker, V. Zaporojtschenko, H. Zimmermann, W. Jäger, I.V. Grekhov, P. SeegebrechtVolume:
45
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0038-1101(00)00158-1
File:
PDF, 275 KB
english, 2001