Channel engineering using RTA prior to the gate oxidation for high density DRAM with single gate CMOS technology
Jeong-Hwan Son, Seung-Ho Lee, Joon-Sung Lee, Youngjong LeeVolume:
45
Year:
2001
Language:
english
Pages:
6
DOI:
10.1016/s0038-1101(00)00205-7
File:
PDF, 276 KB
english, 2001