Effect of N2 plasma treatments on dry etch damage in n- and...

Solid-State Electronics 2001 Vol. 45; Iss. 3

Effect of N2 plasma treatments on dry etch damage in n- and p-type GaN

D.G Kent, K.P Lee, A.P Zhang, B Luo, M.E Overberg, C.R Abernathy, F Ren, K.D Mackenzie, S.J Pearton, Y Nakagawa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
45
Year:
2001
Language:
english
Pages:
4
DOI:
10.1016/s0038-1101(01)00016-8
File:
PDF, 92 KB
english, 2001
Conversion to is in progress
Conversion to is failed