Study on dopant activation of phosphorous implanted...

Solid-State Electronics 2002 Vol. 46; Iss. 8

Study on dopant activation of phosphorous implanted polycrystalline silicon thin films by KrF excimer laser annealing

Chang-Ho Tseng, Ching-Wei Lin, Teh-Hung Teng, Ting-Kuo Chang, Huang-Chung Cheng, A Chin
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
46
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0038-1101(02)00046-1
File:
PDF, 169 KB
english, 2002
Conversion to is in progress
Conversion to is failed