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Conductance transient, capacitance–voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films
S. Dueñas, H. Castán, J. Barbolla, K. Kukli, M. Ritala, M. LeskeläVolume:
47
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0038-1101(03)00172-2
File:
PDF, 804 KB
english, 2003