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Analysis of the hot-carrier degradation of deep-submicrometer large-angle-tilt-implanted drain (LATID) MOSFETs
A. Bravaix, D. VuillaumeVolume:
41
Year:
1997
Language:
english
Pages:
9
DOI:
10.1016/s0038-1101(97)00074-9
File:
PDF, 995 KB
english, 1997