CHARACTERISTICS OF METAL-FERROELECTRIC-INSULATOR-SILICON...

Integrated Ferroelectrics 2008 / 06 Vol. 97; Iss. 1

CHARACTERISTICS OF METAL-FERROELECTRIC-INSULATOR-SILICON DEVICES USING HFSION BUFFER LAYERS

Lu, X. B., Hoko, H., Maruyama, K., Ishiwara, H.
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Volume:
97
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580802088819
Date:
June, 2008
File:
PDF, 391 KB
english, 2008
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