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SPIE Proceedings [SPIE SPIE/COS Photonics Asia - Beijing, China (Thursday 9 October 2014)] Optical Metrology and Inspection for Industrial Applications III - Correction of refraction index based on adjacent pulse repetition interval lengths

Han, Sen, Yoshizawa, Toru, Zhang, Song, Wei, Dong, Aketagawa, Masato
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Volume:
9276
Year:
2014
Language:
english
DOI:
10.1117/12.2069828
File:
PDF, 549 KB
english, 2014
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