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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Shape change of cured 2D and 3D nanostructures from imprint lithography
Resnick, Douglas J., Bencher, Christopher, Chopra, Meghali J., Bonnecaze, Roger T.Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2186050
File:
PDF, 690 KB
english, 2015