Highly Moisture-Resistive SiN x Films Prepared by Catalytic Chemical Vapor Deposition
Heya, Akira, Niki, Toshikazu, Yonezawa, Yasuto, Minamikawa, Toshiharu, Muroi, Susumu, Izumi, Akira, Masuda, Atsushi, Umemoto, Hironobu, Matsumura, HidekiVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.43.l1362
Date:
October, 2004
File:
PDF, 187 KB
english, 2004