An Improved Pregate Cleaning Process for High-k Gate...

An Improved Pregate Cleaning Process for High-k Gate Dielectric Fabrication

Kang, J. F., Yu, H. Y., Ren, C., Liu, X. Y., Han, R. Q., Yu, B., Kwong, D.-L.
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Volume:
8
Year:
2005
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2056415
File:
PDF, 157 KB
english, 2005
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