Atomic Layer Deposition of Tantalum-Incorporated Hafnium...

Atomic Layer Deposition of Tantalum-Incorporated Hafnium Dioxide: Strategies to Enhance Thermal Stability

Wang, Tuo, Ekerdt, John G.
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Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3598172
File:
PDF, 3.33 MB
english, 2011
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