Chemical States of Copper Contaminants on SiO2 Surfaces and Their Removal by ppm-order HCN Aqueous Solutions
Takahashi, Masao, Higashi, Yuhko, Ozaki, Shinji, Kobayashi, HikaruVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3599832
File:
PDF, 930 KB
english, 2011