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Applications of Ni-based silicides to 45 nm CMOS and Beyond
Kittl, Jorge A., Lauwers, Anne, Chamirian, Oxana, Pawlak, Malgorzata A., Van Dal, Mark, Akheyar, Amal, Potter, Muriel De, Kottantharayil, Anil, Pourtois, Geoffrey, Lindsay, Richard, Maex, KarenVolume:
810
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-810-c2.1
Date:
January, 2004
File:
PDF, 998 KB
english, 2004