Effect of N2 Flow Rates on Properties of Nanostructured...

Advanced Materials Research 2013 / 9 Vol. 770

Effect of N2 Flow Rates on Properties of Nanostructured TiAlN Thin Films Prepared by Reactive Magnetron Co-Sputtering

Chaiyakun, Surasing, Somwangsakul, Areerat, Buranawong, Adisorn, Kaewkhao, Jakrapong, Witit-Anun, Nirun
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Volume:
770
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.770.161
Date:
September, 2013
File:
PDF, 568 KB
english, 2013
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