Dual work function metal gate CMOS technology using metal interdiffusion
Polishchuk, I., Ranade, P., Tsu-Jae King,, Chenming Hu,Volume:
22
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.944334
Date:
September, 2001
File:
PDF, 65 KB
english, 2001